Gate-lag effects have been characterized in as-fabricated and hot-carrier-stressed power AlGaAs/GaAs HFET's and then compared with transconductance frequency dispersion measurements and studied by means of numerical simulations accounting for the occupation dynamics of surface deep-acceptor traps. We have found a clear direct correlation between the amount of gate-lag and of transconductance dispersion. The gate-lag turn-off transients of increasingly degraded devices have been accurately simulated by suitably increasing the surface trap density.
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