We describe a lithographic approach-nanocrystal plasma polymerization-based lithography-in which colloidal nanocrystal assemblies (CNAs) are used as the inorganic resist and, potentially, the active material. The patterning process is based on a change in the dispersibility of the CNAs in solvents as a result of the exposure to plasmas. Plasmas can etch the capping ligands from the exposed area. During the development step, the unexposed area of CNAs is redispersed, leaving behind the patterned area, similar to what is expected from negative photoresist. (C) 2016 Society of Photo-Optical Instrumentation Engineers (SPIE)

Optics-free, plasma-based lithography in inorganic resists made up of nanoparticles / Shaw, S; Miller, KJ; Colaux, JL; Cademartiri, L. - In: JOURNAL OF MICRO/NANOLITHOGRAPHY, MEMS, AND MOEMS. - ISSN 1932-5150. - 15:3(2016). [10.1117/1.JMM.15.3.031607]

Optics-free, plasma-based lithography in inorganic resists made up of nanoparticles

Cademartiri L
2016

Abstract

We describe a lithographic approach-nanocrystal plasma polymerization-based lithography-in which colloidal nanocrystal assemblies (CNAs) are used as the inorganic resist and, potentially, the active material. The patterning process is based on a change in the dispersibility of the CNAs in solvents as a result of the exposure to plasmas. Plasmas can etch the capping ligands from the exposed area. During the development step, the unexposed area of CNAs is redispersed, leaving behind the patterned area, similar to what is expected from negative photoresist. (C) 2016 Society of Photo-Optical Instrumentation Engineers (SPIE)
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Utilizza questo identificativo per citare o creare un link a questo documento: http://hdl.handle.net/11381/2874667
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