Epitaxial Ni–Mn–Ga/MgO(100) thin films ranging in thickness from 10 to 100nm

Thin films of Ni–Mn–Ga alloy ranging in thickness from 10 to 100 nm have been epitaxially grown on MgO(1 0 0) substrate. Temperature-dependent X-ray diffraction measurements combined with room-temperature atomic force microscopy and transmission electron microscopy highlight the structural features of the martensitic structure from the atomic level to the microscopic scale, in particular the relationship between crystallographic orientations and twin formation. Depending on the film thickness, different crystallographic and microstructural behaviours have been observed: for thinner Ni–Mn–Ga films (10 and 20 nm), the L21 austenitic cubic phase is present throughout the temperature range being constrained to the substrate. When the thickness of the film exceeds the critical value of 40 nm, the austenite-to-martensite phase transition is allowed. The martensitic phase is present with the unique axis of the pseudo-orthorhombic 7M modulated martensitic structure perpendicular to the film plane. A second critical thickness has been identified at 100 nm where the unique axis has been found both perpendicular and parallel to the film plane. Magnetic force microscopy reveals the out-of-plane magnetic domain structure for thick films. For the film thickness below 40 nm, no magnetic contrast is observed, indicating an in-plane orientation of the magnetization.