The evaluation of the dielectric properties of ferroelectric thin films, at high frequencies, is relevant because they are goo candidates for phase and frequency agile microwave components which are used in circuits such as phase shifters, filters, and local oscillators. Recently, some measuring procedures and main expressions for general analytical formula used in the determination of the dielectric properties of thin films at microwave have been presented. This work describes the methods that involve coplanar waveguide probes (CPW). A finite element analysis has been made on Metal-Insulator-Metal test structure to calculate some parasitic elements that cannot be estimated from measured data. A comparison between different measuments methods is presented.

Test pattern for dielectric properties of thin films at microwave frequencies / Delmonte, Nicola; G., Secchi; B. E., Watts. - (2005), pp. 4-4. ((Intervento presentato al convegno COST action 528, Chemical Solution Deposition of Thin Films : Management Committee and Final Workshop tenutosi a Praga nel 13-15 Novembre 2005.

Test pattern for dielectric properties of thin films at microwave frequencies

DELMONTE, Nicola;
2005-01-01

Abstract

The evaluation of the dielectric properties of ferroelectric thin films, at high frequencies, is relevant because they are goo candidates for phase and frequency agile microwave components which are used in circuits such as phase shifters, filters, and local oscillators. Recently, some measuring procedures and main expressions for general analytical formula used in the determination of the dielectric properties of thin films at microwave have been presented. This work describes the methods that involve coplanar waveguide probes (CPW). A finite element analysis has been made on Metal-Insulator-Metal test structure to calculate some parasitic elements that cannot be estimated from measured data. A comparison between different measuments methods is presented.
Test pattern for dielectric properties of thin films at microwave frequencies / Delmonte, Nicola; G., Secchi; B. E., Watts. - (2005), pp. 4-4. ((Intervento presentato al convegno COST action 528, Chemical Solution Deposition of Thin Films : Management Committee and Final Workshop tenutosi a Praga nel 13-15 Novembre 2005.
File in questo prodotto:
File Dimensione Formato  
COST528_Final_Workshop Program.pdf

non disponibili

Tipologia: Altro materiale allegato
Licenza: Creative commons
Dimensione 2.11 MB
Formato Adobe PDF
2.11 MB Adobe PDF   Visualizza/Apri   Richiedi una copia

I documenti in IRIS sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11381/2538135
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus ND
  • ???jsp.display-item.citation.isi??? ND
social impact