Layering and relaxation in molecular films of a photosensitive polyacrylate from X-ray reflectivity and inelastic neutron scattering experiments / Cristofolini, Luigi; Fontana, M. P.; Konovalov, O.. - In: PHILOSOPHICAL MAGAZINE. B. PHYSICS OF CONDENSED MATTER. STATISTICAL MECHANICS, ELECTRONIC, OPTICAL AND MAGNETIC PROPERTIES. - ISSN 1364-2812. - B82:(2002), pp. 523-531. [10.1080/13642810208223141]

Layering and relaxation in molecular films of a photosensitive polyacrylate from X-ray reflectivity and inelastic neutron scattering experiments

CRISTOFOLINI, Luigi;
2002-01-01

2002
Layering and relaxation in molecular films of a photosensitive polyacrylate from X-ray reflectivity and inelastic neutron scattering experiments / Cristofolini, Luigi; Fontana, M. P.; Konovalov, O.. - In: PHILOSOPHICAL MAGAZINE. B. PHYSICS OF CONDENSED MATTER. STATISTICAL MECHANICS, ELECTRONIC, OPTICAL AND MAGNETIC PROPERTIES. - ISSN 1364-2812. - B82:(2002), pp. 523-531. [10.1080/13642810208223141]
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11381/1870533
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