Low temperature spectrally resolved cathodoluminescence has been used to study the effects of electrical degradation induced by hot-electron-stress on the optical transitions in lattice matched InAlAs/InGaAs/InP HEMTs. A clear reduction of the cathodoluminescence emission collected from the gate-drain region of stressed devices has been found, indicating a modification of the trap density inside the device. Depth resolved analyses from the gate-drain region before and after stress evidenced that the electric field due to the traps induced by the hot-electron-stress mainly influenced a device region between the highly doped InAlAs and InGaAs cap layers and the n+ doped donor and undoped spacer? InAlAs layers. The effect of the hot electron stress has been evidenced mainly on the cathodoluminescence transitions from the InAlAs layers. No evidence of a possible influence on the intrinsic InGaAs channel has been found.
Correlation between hot-electron-stress-induced degradation and cathodoluminescence in InP based HEMTs / G., Salviati; N., Armani; Cova, Paolo; G., Meneghesso; E., Zanoni. - In: MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY. - ISSN 0921-5107. - 80:(2001), pp. 289-293. [10.1016/S0921-5107(00)00643-7]
Correlation between hot-electron-stress-induced degradation and cathodoluminescence in InP based HEMTs
COVA, Paolo;
2001-01-01
Abstract
Low temperature spectrally resolved cathodoluminescence has been used to study the effects of electrical degradation induced by hot-electron-stress on the optical transitions in lattice matched InAlAs/InGaAs/InP HEMTs. A clear reduction of the cathodoluminescence emission collected from the gate-drain region of stressed devices has been found, indicating a modification of the trap density inside the device. Depth resolved analyses from the gate-drain region before and after stress evidenced that the electric field due to the traps induced by the hot-electron-stress mainly influenced a device region between the highly doped InAlAs and InGaAs cap layers and the n+ doped donor and undoped spacer? InAlAs layers. The effect of the hot electron stress has been evidenced mainly on the cathodoluminescence transitions from the InAlAs layers. No evidence of a possible influence on the intrinsic InGaAs channel has been found.File | Dimensione | Formato | |
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